Polishing pad with grooves to retain slurry on the pad texture

Details Polishing pad with grooves to retain slurry on the pad texture Polishing pad with grooves to retain slurry on the pad texture

2007-12-25

2007-12-25

Morgan, Eileen P. (Department: 3723)

Abrading

Flexible-member tool, per se

C451S527000, C451S287000

Reexamination Certificate

active

11700346

ABSTRACT:
A rotational chemical mechanical polishing pad designed for use with a polishing medium. The polishing pad includes a polishing layer having a polishing surface containing a plurality of grooves. At least a portion of each of the plurality of grooves has a shape and orientation determined as a function of the trajectory of the polishing medium during use of the pad.

REFERENCES:
patent: 6241596 (2001-06-01), Osterheld et al.
patent: 6783436 (2004-08-01), Muldowney
patent: 6843709 (2005-01-01), Crkvenac et al.
patent: 6843711 (2005-01-01), Muldowney
patent: 6955587 (2005-10-01), Muldowney
patent: 7059949 (2006-06-01), Elmufdi et al.
patent: 7059950 (2006-06-01), Muldowney
patent: 7108597 (2006-09-01), Muldowney
patent: 7125318 (2006-10-01), Muldowney
patent: 7131895 (2006-11-01), Elmufdi et al.
patent: 7234224 (2007-06-01), Naugler et al.
patent: 2007/0032182 (2007-02-01), Suzuki
patent: 2007/0066195 (2007-03-01), Duong

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