Polishing pad, the use thereof and the method for...

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

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Details

C451S533000, C451S536000

Reexamination Certificate

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07815491

ABSTRACT:
The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; a two-component paste formed on the upper surface of the membrane with low permeability for adhering the base material to the membrane with low permeability; and a polyurethane paste formed on the lower surface of the membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.

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Office Action From Chinese Patent Patent Office Correspondingn to Chna (PRC) Patent Application No. 2007101523001 Dated Jun. 19, 2009.
Search report from corresponding ROC (Taiwan) Patent Application No. 096119161.

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