Polishing pad, polishing apparatus having the same, and...

Details Polishing pad, polishing apparatus having the same, and... Polishing pad, polishing apparatus having the same, and...

2006-02-14

2006-02-14

Nguyen, Dung Van (Department: 3723)

Abrading

Flexible-member tool, per se

Interrupted or composite work face

C451S530000

Reexamination Certificate

active

06997793

ABSTRACT:
A plurality of projections and grooves are formed on a polishing member. The grooves are formed in grid pattern. A portion on which the grooves and the projections are formed (polishing portion) has a substantially circular shape in a plane view. Around the polishing portion, an outer peripheral portion having a fixed height is provided. The height of the outer peripheral portion is equal to the height of bottom portions of the grooves. Ends of each of the grooves extend to the outer peripheral portion, which allows slurry and the like entering the grooves to flow outside via the outer peripheral portion. When a polishing pad thus structured is to be bonded to a surface plate, adhesive is applied or a double-stick tape is affixed to a rear surface of a base member, and thereafter, the polishing pad is put in place on the surface plate. Next, the polishing portion is pressed to the surface plate from an upper side, and subsequently the outer peripheral portion is pressed to the surface plate from the upper side.

REFERENCES:
patent: 5882251 (1999-03-01), Berman et al.
patent: 6165904 (2000-12-01), Kim
patent: 6241596 (2001-06-01), Osterheld et al.
patent: 6273806 (2001-08-01), Bennett et al.
patent: 6331137 (2001-12-01), Raeder et al.
patent: 6699115 (2004-03-01), Osterheld et al.
Patent Abstracts of Japan, No. 10071561 A, date Mar. 17, 1998. Cited in the specification.

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