Polishing pad, method of manufacturing glass substrate for...

Details Polishing pad, method of manufacturing glass substrate for... Polishing pad, method of manufacturing glass substrate for...

2005-08-23

2005-08-23

Nguyen, Dung Van (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S057000

Reexamination Certificate

active

06932677

ABSTRACT:
A polishing pad used for precise polishing of the surface of a lapped glass workpiece when a glass substrate for use in data recording media is manufactured from a glass workpiece. The polishing pad comprises a base and a polishing portion laminated on the base and contacting the surface of the glass workpiece at the time of polishing. The polishing portion is formed of a foam made of a synthetic resin having a 100% modulus of 11.8 MPa or less. A type of parameter representing the surface roughness of the polishing portion, namely, the maximum height (Rmax), is 70 μm or less.

REFERENCES:
patent: 6736705 (2004-05-01), Benning et al.
patent: 6749487 (2004-06-01), Okuhata et al.
patent: 2003/0109202 (2003-06-01), Matsuno et al.
patent: 2003/0110803 (2003-06-01), Saito et al.
patent: 2000-288922 (2000-10-01), None

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