Polishing pad having a pressure relief channel

Details Polishing pad having a pressure relief channel Polishing pad having a pressure relief channel

2007-08-07

2007-08-07

Loney, Donald J. (Department: 1772)

Stock material or miscellaneous articles

Structurally defined web or sheet

Longitudinal or transverse tubular cavity or cell

C451S527000, C451S533000

Reexamination Certificate

active

10869657

ABSTRACT:
The present invention provides a chemical mechanical polishing pad comprising a window formed in the polishing pad, the window having a void provided on a side thereof. The polishing pad further comprises a void-pressure relief channel provided in the polishing pad from the void to a periphery of the polishing pad.

REFERENCES:
patent: 5605760 (1997-02-01), Roberts
patent: 6884156 (2005-04-01), Prasad et al.
patent: 2002/0115379 (2002-08-01), Sevilla et al.
patent: 2003/0171081 (2003-09-01), Komukai et al.
patent: 2003-300150 (2003-10-01), None
Webster's II Dictionary, 1984, p. 1321.

Affiliated with

Also associated with

Rating

Polishing pad having a pressure relief channel does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing pad having a pressure relief channel, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing pad having a pressure relief channel will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3833060