Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2008-05-20
2008-05-20
Ackun, Jr., Jacob K. (Department: 3728)
Abrading
Abrading process
Glass or stone abrading
C451S532000
Reexamination Certificate
active
07374474
ABSTRACT:
In CMP technology for planarizing an interlayer insulation film, a BPSG film, an insulation film for shallow trench isolation, or the like, in the production process of a semiconductor element, irregularities of a matter being polished, e.g. a silicon oxide film, are planarized efficiently at a high speed while suppressing the occurrence of polishing flaws on the substrate by employing a polishing pad having organic fibers exposed on the surface thereof abutting against the matter being polished.
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Office Action dated Mar. 12, 2007 issued in corresponding Japan Application No. 2001-311409.
Habiro Masanobu
Hiraoka Hirokazu
Iwatsuki Yasuhito
Nishiyama Masaya
Ackun Jr. Jacob K.
Hitachi Chemical Co. Ltd.
Westerman, Hattori, Daniels & Adrian , LLP.
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