Polishing pad and method of producing the same

Details Polishing pad and method of producing the same Polishing pad and method of producing the same

2006-01-17

2006-01-17

Nguyen, George (Department: 3723)

Abrading

Flexible-member tool, per se

Interrupted or composite work face

C451S921000, C451S530000, C451S533000, C451S537000, C451S539000, C451S550000

Reexamination Certificate

active

06986706

ABSTRACT:
A polishing pad has a working layer provided with an abrasive powder, an attaching layer for attaching a pad to a polishing head of a power tool, and a connection layer which connects the working layer with the attaching layer, the connection layer being located between the working and the attaching layer and having a peripheral region which is thinner and also a central region which is thicker than the peripheral region and therefore has an increased elasticity so that during polishing an elasticity of a central portion of the working layer is increased.

REFERENCES:
patent: 3991527 (1976-11-01), Maran
patent: 5201785 (1993-04-01), Nagano
patent: 5769699 (1998-06-01), Yu
patent: 5775984 (1998-07-01), Olson et al.
patent: 5899745 (1999-05-01), Kim et al.
patent: 6454644 (2002-09-01), Miyazaki et al.
patent: 6604990 (2003-08-01), Cooper et al.

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