Polishing pad

Details Polishing pad Polishing pad

2011-01-18

2011-01-18

Eley, Timothy V (Department: 3724)

Abrading

Abrading process

Glass or stone abrading

C051S297000, C451S059000, C451S527000, C451S533000

Reexamination Certificate

active

07871309

ABSTRACT:
It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light-transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).

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Office Action issued by the Japanese Patent Office on Nov. 5, 2010 for the counterpart Japanese Patent Application No. 2004-358595.

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