Polishing pad

Details Polishing pad Polishing pad

2011-01-11

2011-01-11

Rachuba, Maurina (Department: 3727)

Abrading

Flexible-member tool, per se

Interrupted or composite work face

C451S528000, C451S529000

Reexamination Certificate

active

07867066

ABSTRACT:
A polishing pad having a novel structure, which is applicable to highly accurate various polishing process, such as a CMP process, is provided. An annular rear plane groove (22) extending in a circumferential direction is formed on a rear plane (20) of the polishing pad.

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International Preliminary Report on Patentability and written opinion issued in the corresponding application No. PCT/JP2005/023255, mailed on Jul. 12, 2007.

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