Polishing pad

Details Polishing pad Polishing pad

2008-08-28

2011-11-29

Rachuba, Maurina (Department: 3727)

Abrading

Flexible-member tool, per se

Interrupted or composite work face

C451S529000, C451S533000

Reexamination Certificate

active

08066555

ABSTRACT:
A polishing pad includes polishing elements interdigitated with one another over a surface of the polishing pad. Each of the polishing elements is secured so as to restrict lateral movement thereof with respect to others of the polishing elements, but remains moveable in an axis normal to a polishing surface of the polishing elements. Different densities of the polishing elements may be positioned within different areas of the surface of the polishing pad.

REFERENCES:
patent: 6964604 (2005-11-01), Chen et al.
patent: 6988942 (2006-01-01), Chen et al.
patent: 7029747 (2006-04-01), Huh et al.
patent: 7815778 (2010-10-01), Bajaj
patent: 2007/0131564 (2007-06-01), Bajaj
SEMIQUEST, Inc.; PCT/US2008/074658 filed Aug. 28, 2008; International Preliminary Report on Patentability; IPEA/US; mailed Aug. 3, 2010; 9 pp.
PCT/US2008/074658 filed Aug. 28, 2008, Semiquest, Inc. et al, International Search Report and Written Opinion, ISA/US, 8pp.

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