Polishing pad

Details Polishing pad Polishing pad

2007-05-15

2007-05-15

Morgan, Eileen P. (Department: 3723)

Abrading

Flexible-member tool, per se

C451S533000, C051S298000

Reexamination Certificate

active

11246199

ABSTRACT:
A polishing pad having a polishing layer which has specific composition and a ratio of the storage elastic modulus at 30° C. to the storage elastic modulus at 60° C. of 2 to 15 and a ratio of the storage elastic modulus at 30° C. to the storage elastic modulus at 90° C. of 4 to 20 and is made of a polyurethane or polyurethane-urea. This polishing pad suppresses the scratching of the surface to be polished and planarizes the surface efficiently. A polishing pad having a polishing layer containing water-soluble particles can achieve a higher removal rate.

REFERENCES:
patent: 6293852 (2001-09-01), Roberts et al.
patent: 6337280 (2002-01-01), Yano
patent: 6454634 (2002-09-01), James et al.
patent: 6790883 (2004-09-01), Ogawa et al.
patent: 6979701 (2005-12-01), Kaneda et al.
patent: 2004/0055223 (2004-03-01), Ono et al.
patent: 2005/0064709 (2005-03-01), Shimomura et al.
patent: 2006/0148393 (2006-07-01), Ono et al.
patent: 8-500622 (1996-01-01), None
patent: 2000-33552 (2000-02-01), None
patent: 2000-34416 (2000-02-01), None
patent: 2001-334455 (2001-12-01), None
patent: WO 94/04599 (1994-03-01), None
patent: WO 2004/024393 (2004-03-01), None

Affiliated with

Also associated with

Rating

Polishing pad does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing pad, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing pad will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3787058