Abrading – Precision device or process - or with condition responsive... – By optical sensor
Patent
1995-02-17
1997-07-01
Rose, Robert A.
Abrading
Precision device or process - or with condition responsive...
By optical sensor
451288, B24B 4904, B24B 4912, B24B 722
Patent
active
056430469
ABSTRACT:
A polishing method and apparatus are provided for detecting the polishing end point of a semi-conductor wafer having a polishing film and a stopper film formed thereon. First driving means are provided having a first drive shaft for rotating a polishing plate and a polishing cloth thereon. Second driving means having a second rotatable drive shaft are also provided. Mounting means for mounting the semi-conductor wafer is adapted to be rotated by the second driving means for polishing the wafer. Energy supplying means for supplying prescribed energy to the semi-conductor wafer are also included. Finally, detecting means for detecting a polishing end point of the polishing film is included and detects a variation of the energy supplied to the semi-conductor wafer. Different types of energy can be utilized such as infrared light and a vibration wave.
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patent: 5308438 (1994-05-01), Cote et al.
patent: 5433650 (1995-07-01), Winebarger
Akiyama Tatsuo
Katakabe Ichiro
Miyashita Naoto
Kabushiki Kaisha Toshiba
Meller Michael N.
Rose Robert A.
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