Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2005-04-05
2005-04-05
Nguyen, Dung Van (Department: 3723)
Abrading
Abrading process
Glass or stone abrading
C451S526000
Reexamination Certificate
active
06875088
ABSTRACT:
There is provide a polishing member including photocatalyst particles that exhibit photocatalysis on light irradiation, and a support material that supports the photocatalyst particles. There is also provided a method of manufacturing a semiconductor device, including polishing a surface of a workpiece that is to be used as at least a portion of the semiconductor device with the polishing member with a fluid interposed between the polishing member and the surface of the workpiece while performing light irradiation onto the polishing member.
REFERENCES:
patent: 6364744 (2002-04-01), Merchant et al.
patent: 6383065 (2002-05-01), Grumbine et al.
patent: 6435947 (2002-08-01), Mueller et al.
patent: 2001-308041 (2001-11-01), None
Matsui, Y. et al., “Chemical Mechanical Polishing Slurry Containing Abrasive Particles Exhibiting Photocatalytic Function”, U.S. Appl. No. 10/201,488, filed Jul. 24, 2002.
Matsui Yukiteru
Yano Hiroyuki
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Nguyen Dung Van
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