Polishing medium for chemical-mechanical polishing, and...

Details Polishing medium for chemical-mechanical polishing, and... Polishing medium for chemical-mechanical polishing, and...

2005-08-11

2010-06-29

Deo, Duy-Vu N (Department: 1792)

Abrasive tool making process, material, or composition

With hydrocarbon

C051S307000, C051S308000, C051S309000

Reexamination Certificate

active

07744666

ABSTRACT:
This invention provides a polishing medium for chemical-mechanical polishing, comprising an oxidizing agent for a conductor, a protective-film-forming agent for protecting a metal surface, an acid, and water; (1) the polishing medium having a pH of 3 or less, and the oxidizing agent being in a concentration of from 0.01 to 3% by weight, or (2) the polishing medium containing abrasive grains having an average particle diameter of 50 nm or less, and the abrasive grains having standard deviation of particle size distribution in a value of more than 5 nm.

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