Polishing machine and method

Abrading – Precision device or process - or with condition responsive... – Computer controlled

Reexamination Certificate

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C451S057000, C451S285000

Reexamination Certificate

active

06875076

ABSTRACT:
An apparatus and method is provided for polishing work pieces such as semiconductor wafers. The apparatus includes a variable number of independent heads20, platens32and polishing units18. This polishing apparatus belongs to a group of polishing machines with wafers attached to the same heads20through all polishing steps without undesirable reloading from one head20to another between polishing steps. Each independent head20is automatically coupled to and decoupled from any of the polishing units18to optimize throughput and provide flexibility in accommodating different polishing processes. A head transfer subsystem22provides an independent means of transfer for each head20, thus an infinite number of contemporaneous or overlapping polishing cycles can be completed on multiple wafers resulting in maximum processing throughput.

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