Polishing liquid composition

Details Polishing liquid composition Polishing liquid composition

2006-05-16

2009-10-20

Hendricks, Keith D (Department: 1794)

Etching a substrate: processes

Nongaseous phase etching of substrate

Using film of etchant between a stationary surface and a...

C216S089000, C252S079100

Reexamination Certificate

active

07604751

ABSTRACT:
A polishing liquid composition is applicable as a means of forming embedded metal interconnections on a semiconductor substrate. In a surface to be polished comprising an insulating layer and a metal interconnection layer, the polishing liquid composition is capable of maintaining a polishing speed of the metal layer, of suppressing an etching speed, and of preventing dishing of the metal layer.

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