Abrading – Precision device or process - or with condition responsive... – By optical sensor
Patent
1999-07-19
2000-10-03
Rose, Robert A.
Abrading
Precision device or process - or with condition responsive...
By optical sensor
451 21, B24B 4912
Patent
active
06126511&
ABSTRACT:
Disclosed herein is a polishing device including a polishing plate having an upper surface on which a polishing pad is attached, a polishing head having a lower surface opposed to an upper surface of the polishing pad on the polishing plate, for holding a substrate to be polished on the lower surface, and a pressure source for applying a polishing pressure to the polishing head, whereby the substrate held by the polishing head is pressed against the upper surface of the polishing pad under the polishing pressure applied from the pressure source to perform polishing of the substrate. The polishing head is provided with a contact pressure adjusting mechanism capable of adjusting an in-plane contact pressure of the substrate against the upper surface of the polishing pad on the polishing plate at every area of the substrate. Accordingly, the uniformity and the planarity in the plane of the substrate surface to be polished can be improved with a high throughput.
REFERENCES:
patent: 4422764 (1983-12-01), Eastman
patent: 4693012 (1987-09-01), Cesna
patent: 5220405 (1993-06-01), Barbee et al.
patent: 5483568 (1996-01-01), Yano et al.
patent: 5531635 (1996-07-01), Mogi et al.
Hayakawa Hideaki
Komuro Yoshiaki
Saito Takatoshi
Sato Shuzo
Kananen Ronald P.
Rose Robert A.
Sony Corporation
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