Polishing composition for CMP operations

Details Polishing composition for CMP operations Polishing composition for CMP operations

1997-03-20

1999-01-19

Bonner, Melissa

Compositions: coating or plastic

Coating or plastic compositions

Polishes

106 11, 10628714, 10628713, 216 89, 438692, 438693, 51298, 51300, 51303, 51308, C09G 102, B24B 100

Patent

active

058610553

ABSTRACT:
A polishing composition is shown which includes (1) a polishing media particle; (2) a film forming binder for suspending the particle and forming a temporary film on an exposed surface of the workpiece, the temporary film being dissolvable in a subsequently applied polishing wash, whereby the polishing media particle is freed to polish the workpiece; (3) a solvent for suspending the polishing media particle in the film forming binder to facilitate forming the temporary film; and (4) a wetting agent to improve the wettability of the composition on the exposed surface of the workpiece.

REFERENCES:
patent: 2523281 (1950-09-01), Currie
patent: 4260396 (1981-04-01), Glemza
patent: 4462188 (1984-07-01), Payne
patent: 4544377 (1985-10-01), Schwen
patent: 4665116 (1987-05-01), Kornhaber et al.
patent: 5043012 (1991-08-01), Shinohara et al.
patent: 5264010 (1993-11-01), Brancaleoni et al.
patent: 5352277 (1994-10-01), Sasaki
patent: 5389352 (1995-02-01), Wang
patent: 5470798 (1995-11-01), Ouellet
patent: 5645736 (1997-07-01), Allman

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