Polishing composition and rinse composition

Details Polishing composition and rinse composition Polishing composition and rinse composition

2007-05-01

2007-05-01

Marcheschi, Michael (Department: 1755)

Abrasive tool making process, material, or composition

With inorganic material

Clay, silica, or silicate

C106S003000, C106S005000

Reexamination Certificate

active

10674209

ABSTRACT:
A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.

REFERENCES:
patent: 3715842 (1973-02-01), Tredinnick et al.
patent: 4169337 (1979-10-01), Payne
patent: 4462188 (1984-07-01), Payne
patent: 4588421 (1986-05-01), Payne
patent: 5073591 (1991-12-01), Tsaur
patent: 5352277 (1994-10-01), Sasaki
patent: 6258721 (2001-07-01), Li et al.
patent: 6280652 (2001-08-01), Inoue et al.
patent: 2001/0003672 (2001-06-01), Inoue et al.
patent: 2002/0095872 (2002-07-01), Tsuchiya et al.
patent: 2002/0151252 (2002-10-01), Kawase et al.
patent: 63272459 (1988-09-01), None
patent: 11-116942 (1999-04-01), None

Affiliated with

Also associated with

Rating

Polishing composition and rinse composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing composition and rinse composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing composition and rinse composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3739426