Polishing composition and polishing method employing it

Details Polishing composition and polishing method employing it Polishing composition and polishing method employing it

2005-02-08

2005-02-08

Eley, Timothy V. (Department: 3724)

Abrading

Abrading process

Utilizing fluent abradant

C051S309000, C106S003000, C252S180000, C451S041000

Reexamination Certificate

active

06852009

ABSTRACT:
A polishing composition which comprises the following components (a) to (d):(a) silicon dioxide,(b) at least one basic substance selected from the group consisting of an inorganic salt of an alkali metal, an ammonium salt, piperazine and ethylenediamine,(c) at least one chelating agent selected from the group consisting of a compound represented by the following general formula [1] and its salt:wherein each of R1and R2which are the same or different, is a lower alkylene group, and n is an integer of from 0 to 4, and(d) water.

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