Polishing composition and polishing method employing it

Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

216 99, 216106, 134 13, 510398, 510507, 510511, 252 791, C23F 118, C23F 130

Patent

active

061397636

ABSTRACT:
A polishing composition comprising the following components:

REFERENCES:
patent: 5366542 (1994-11-01), Yamada et al.
patent: 5575885 (1996-11-01), Hirabayashi et al.
patent: 5736495 (1998-04-01), Bolkan et al.
patent: 5770095 (1998-06-01), Sasaki et al.
patent: 5897375 (1999-04-01), Watts et al.
patent: 5980775 (1999-11-01), Grumbine et al.
patent: 5993686 (1999-11-01), Streinz et al.
patent: 6001730 (1999-12-01), Farkas et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Polishing composition and polishing method employing it does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing composition and polishing method employing it, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing composition and polishing method employing it will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2047664

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.