Polishing composition and polishing method

Details Polishing composition and polishing method Polishing composition and polishing method

2011-03-08

2011-03-08

Green, Anthony J (Department: 1731)

Abrasive tool making process, material, or composition

With inorganic material

C051S308000, C051S309000, C438S692000, C438S693000

Reexamination Certificate

active

07901474

ABSTRACT:
The present invention provide a chemical-mechanical polishing composition for inhibiting dishing and erosion as well as rapidly polishing an insulating film and barrier film at the same time while maintaining the flatness of the substrate surface polished. The present chemical-mechanical polishing composition comprises methanesulfonic acid, an alkali metal ion, an oxidizing agent, a silica abrasive and water, and has a pH of 8 to 12.

REFERENCES:
patent: 5391258 (1995-02-01), Brancaleoni et al.
patent: 5770095 (1998-06-01), Sasaki et al.
patent: 5920500 (1999-07-01), Tehrani et al.
patent: 6579153 (2003-06-01), Uchikura et al.
patent: 6930037 (2005-08-01), Tsuchiya et al.
patent: 2001/0049913 (2001-12-01), Miyata
patent: 2003/0051413 (2003-03-01), Sakai et al.
patent: 2008/0087644 (2008-04-01), Nishioka et al.
patent: 08-083780 (1996-03-01), None
patent: 10-116490 (1998-05-01), None
patent: 2819196 (1998-10-01), None
patent: 2001-115146 (2001-04-01), None
patent: 2001-196336 (2001-07-01), None
patent: 3450247 (2003-07-01), None
patent: 2000-109818 (2004-04-01), None
patent: 2004-263074 (2004-09-01), None
patent: WO 2004/076574 (2004-09-01), None

Affiliated with

Also associated with

Rating

Polishing composition and polishing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing composition and polishing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing composition and polishing method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2622255