Polishing composition and method of polishing

Details Polishing composition and method of polishing Polishing composition and method of polishing

1974-12-24

1977-05-10

Ziegler, J.

Compositions: coating or plastic

Coating or plastic compositions

Polishes

51309R, 106 733, 106286, 106299, C09G 102

Patent

active

040226255

ABSTRACT:
A polishing composition suitable for polishing semi-conductive materials, e.g. silicon and germanium, comprises an aqueous slurry containing as a polishing agent a finely divided calcium-titanium-zirconium-oxygen product having the empirical formula CaTiZr.sub.3 O.sub.9. Additional materials that may be present include sodium hypochlorite, sodium metasilicate, potassium hydroxide, and glycerine.

REFERENCES:
patent: 2535526 (1950-12-01), Ballard
patent: 2653107 (1953-09-01), Blumenthal
patent: 2877104 (1959-03-01), Robie
patent: 2996369 (1961-08-01), Harris et al.
patent: 3222148 (1965-12-01), Hay
patent: 3429080 (1969-02-01), Lachapelle
patent: 3485608 (1969-12-01), Cecil
patent: 3870787 (1975-03-01), Blumenthal

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