Polishing composition

Details Polishing composition Polishing composition

2003-12-18

2009-06-30

Marcheschi, Michael A (Department: 1793)

Abrasive tool making process, material, or composition

With inorganic material

C051S309000, C106S003000, C216S096000, C216S101000, C216S108000, C510S165000, C510S167000

Reexamination Certificate

active

07553345

ABSTRACT:
A microwaviness reducing agent for polishing a substrate for a precision part, containing either a surfactant having two or more ionic hydrophilic groups, or a polycarboxylic acid compound having 2 to 15 total carbon atoms and having either OH group or groups or SH group or groups, or a salt thereof; a polishing composition for a substrate for a precision part, containing the microwaviness reducing agent, an abrasive and water; a polishing composition comprising water, an abrasive, an organic acid or a salt thereof, and a surfactant, wherein the organic acid is a polycarboxylic acid compound having 2 to 15 total carbon atoms and having either OH group or groups or SH group or groups, and wherein the surfactant has two or more ionic hydrophilic groups in its molecule and has a molecular weight of 300 or more; a method of reducing microwaviness of a substrate for a precision part; and a method for manufacturing a substrate for a precision part.

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