Polishing composition

Details Polishing composition Polishing composition

2007-04-17

2007-04-17

Norton, Nadine (Department: 1765)

Compositions

Etching or brightening compositions

C252S079200, C252S079400, C438S692000

Reexamination Certificate

active

10625610

ABSTRACT:
A polishing composition comprising 0.03 to 0.5% by weight of an organic acid or a salt thereof, an abrasive and water, wherein the abrasive has a surface potential of from −140 to 200 mV; a roll-off reducing agent comprising an inorganic compound having a property of controlling a surface potential of an abrasive in a polishing composition, wherein a surface potential of the abrasive in a standard polishing composition is controlled to −110 to 250 mV by the presence of the inorganic compound, wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, the abrasive being high-purity alumina having Al2O3purity of 98.0% by weight or more composed of α-type corundum crystal, 1 part by weight of citric acid, 78 parts by weight of water and 1 part by weight of an inorganic compound. The polishing composition or the roll-off reducing agent composition can be favorably used in polishing the substrate for precision parts.

REFERENCES:
patent: 6033596 (2000-03-01), Kaufman et al.
patent: 6379406 (2002-04-01), Thomas et al.
patent: 6436811 (2002-08-01), Wake et al.
patent: 2001/0051746 (2001-12-01), Hagihara et al.
patent: 2002/0028580 (2002-03-01), Nojo et al.
patent: 2003/0064596 (2003-04-01), Lee et al.
patent: 1281023 (2001-01-01), None
patent: 1116762 (2001-07-01), None
patent: 2350369 (2000-11-01), None
patent: 2354525 (2001-03-01), None
patent: 2354769 (2001-04-01), None
patent: 2371555 (2002-07-01), None
patent: 9-256171 (1997-09-01), None
patent: 11-21545 (1999-01-01), None
patent: 11-33896 (1999-02-01), None
patent: 11-283943 (1999-10-01), None
patent: 2001-155332 (2001-06-01), None
patent: 2002-12857 (2002-01-01), None
patent: 2002-20732 (2002-01-01), None
patent: 2002-167575 (2002-06-01), None
patent: 2003-510446 (2003-03-01), None
patent: 2003-151928 (2003-05-01), None

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