Polishing composition

Details Polishing composition Polishing composition

1997-12-05

2000-02-22

Kopec, Mark

Compositions

Electrically conductive or emissive compositions

Metal compound containing

106636, 1062867, 106 3, 427331, H01B 104, C09D 100

Patent

active

06027669&

ABSTRACT:
A polishing composition comprising fumed silica, a basic potassium compound and water, of which the specific electric conductivity is from 100 to 5,500 .mu.S/cm.

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Patent Abstracts of Japan, vol. 97, No. 2, Feb. 28, 1997, JP 8-267356, Oct. 15, 1996.

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