Polishing composition

Abrasive tool making process – material – or composition – With inorganic material – Clay – silica – or silicate

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C106S003000, C438S692000, C438S693000

Reexamination Certificate

active

07147682

ABSTRACT:
A polishing composition for a substrate for memory hard disk comprising water and silica particles, wherein the silica particles have a particle size distribution in which the relationship of a particle size (R) and a cumulative volume frequency (V) in a graph of particle size-cumulative volume frequency obtained by plotting a cumulative volume frequency (%) of the silica particles counted from a small particle size side against a particle size (nm) of the silica particles satisfies the above formula (1) and the above formula (2), and wherein a particle size at 90% of a cumulative volume frequency (D90) is within the range of 65 nm or more and less than 105 nm. By using the polishing composition of the present invention, there can be efficiently manufactured an Ni—P plated substrate for a disk polished to have an excellent surface smoothness, in which the micropits are effectively reduced.

REFERENCES:
patent: 6551175 (2003-04-01), Koichi et al.
patent: 2001/0017007 (2001-08-01), Hagihara et al.
patent: 2002/0194789 (2002-12-01), Oshima
patent: 2003/0110711 (2003-06-01), Ota et al.
patent: 2004/0040217 (2004-03-01), Takashina et al.
patent: 2004/0127147 (2004-07-01), Suenaga et al.
patent: 0773270 (1997-05-01), None
patent: 1123956 (2001-08-01), None
patent: 9-193004 (1997-07-01), None
patent: 2001-323254 (2001-11-01), None
patent: 2002-030274 (2002-01-01), None
patent: 2003-230587 (2003-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Polishing composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Polishing composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing composition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3690899

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.