Polishing composition

Details Polishing composition Polishing composition

2006-06-13

2006-06-13

Wilson, Lee D. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C438S690000, C252S079100

Reexamination Certificate

active

07059941

ABSTRACT:
A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consisting of a monoamine or diamine compound; a polyamine having three or more amino groups in its molecule; an ether group-containing amine; and a heterocyclic compound having nitrogen atom. The polishing composition can be used for removing an insulating film which has been embedded for isolation into a trench formed on a silicon substrate and sedimented outside the trench, thereby planing a surface of the silicon substrate.

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