Polishing composition

Details Polishing composition Polishing composition

2005-06-07

2005-06-07

Marcheschi, Michael A (Department: 1755)

Abrasive tool making process, material, or composition

With inorganic material

C051S308000, C051S309000, C106S003000, C438S692000, C438S693000, C216S103000, C216S106000, C216S108000

Reexamination Certificate

active

06902591

ABSTRACT:
A polishing composition comprising an abrasive, water and an organic acid or a salt thereof, wherein the composition has a specified viscosity of from 1.0 to 2.0 mPa·s at a shearing rate of 1500 s−1and 25° C.; a roll-off reducing agent comprising a Brönsted acid or a salt thereof, having an action of lowering viscosity so that the amount of viscosity lowered is 0.01 mPa·s or more, wherein the amount of viscosity lowered is expressed by the following equation:in-line-formulae description="In-line Formulae" end="lead"?(Amount of Viscosity Lowered)=(Viscosity of Standard Polishing Composition)−(Viscosity of Roll-Off Reducing Agent-Containing Polishing Composition),in-line-formulae description="In-line Formulae" end="tail"?wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, said abrasive being high-purity alumina having Al2O3purity of 98.0% by weight or more composed of α-type co-random crystal, 1 part by weight of citric acid, and 79 parts by weight of water; the roll-off reducing agent-containing polishing composition is prepared which comprises 20 parts by weight of an abrasive, said abrasive being high-purity alumina having Al2O3purity of 98.0% by weight or more composed of α-type co-random crystal, 1 part by weight of citric acid, 78.9 parts by weight of water and 0.1 parts by weight of a roll-off reducing agent; and the viscosity is a viscosity at a shearing rate of 1500 s−1and 25° C. The polishing composition can be favorably used in polishing the substrate for precision parts.

REFERENCES:
patent: 5800577 (1998-09-01), Kido
patent: 6193790 (2001-02-01), Tani
patent: 0984049 (2000-03-01), None
patent: 2338490 (1999-12-01), None
patent: 2002-12857 (2002-01-01), None
patent: 2002-20732 (2002-01-01), None
patent: 2002-167575 (2002-06-01), None
patent: WO 99/35089 (1999-07-01), None

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