Polishing composition

Details Polishing composition Polishing composition

2005-06-28

2005-06-28

Rose, Robert A. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C051S307000, C252S079100

Reexamination Certificate

active

06910952

ABSTRACT:
A polishing composition for a substrate for memory hard disk, comprising silica particles in an aqueous medium, wherein the silica particles satisfy a specified relationship between an average particle size of the silica particles on the number basis and a standard deviation on the number basis, wherein the average particle size is obtained by a determination by transmission electron microscope (TEM) observation, and wherein a particle size and a cumulative volume frequency in a range of particle sizes of from 60 to 120 nm satisfies a specified relationship; a method of reducing microwaviness of a substrate for memory hard disk, comprising the step of polishing the substrate for memory hard disk with the polishing composition; and a method for manufacturing a substrate for memory hard disk, comprising the step of polishing a Ni—P plated substrate for memory hard disk with the polishing composition. The method can be suitably used for the manufacture of a substrate for precision parts, such as a substrate for memory hard disk.

REFERENCES:
patent: 4169337 (1979-10-01), Payne
patent: 4304575 (1981-12-01), Payne
patent: 4462188 (1984-07-01), Payne
patent: 2003/0110711 (2003-06-01), Ota et al.
patent: 1123956 (2001-08-01), None
patent: 2354769 (2001-04-01), None
patent: 2375116 (2002-11-01), None
patent: 2001-6162 (2001-01-01), None
patent: 2002-30274 (2002-02-01), None

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