Polishing composition

Details Polishing composition Polishing composition

1997-01-27

1998-03-31

Bonner, Melissa

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

438693, 106 3, C09K 314, B24B 100

Patent

active

057338191

ABSTRACT:
A polishing composition comprising silicon nitride fine powder, water and an acid.

REFERENCES:
patent: 5084071 (1992-01-01), Nenadic et al.
patent: 5354490 (1994-10-01), Yu et al.
patent: 5525191 (1996-06-01), Maniar et al.

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