Polishing cloth for and method of texturing a surface

Abrading – Abrading process – Side face of disk

Reexamination Certificate

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C451S028000, C451S041000

Reexamination Certificate

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06869340

ABSTRACT:
A polishing cloth has a base material of a woven cloth formed by weaving in woven bundles of plastic fibers and its surface layer is formed by portions of these woven bundles which are cut and raised from a surface. When such a polishing cloth is used for texturing a target surface of a disk substrate, the target surface is rubbed by such a cloth while a liquid slurry containing free abrasive particles are supplied to the surface.

REFERENCES:
patent: 2690661 (1954-10-01), Briggs
patent: 3280517 (1966-10-01), Copeland
patent: 4136221 (1979-01-01), Okamoto et al.
patent: 4381805 (1983-05-01), Troy
patent: 4668553 (1987-05-01), Scott et al.
patent: 4692365 (1987-09-01), Kratzsch et al.
patent: 6074284 (2000-06-01), Tani et al.
patent: 6312485 (2001-11-01), Kaiser et al.

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