Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1996-05-17
1999-11-16
Powell, William
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
216 88, 438692, C23F 102, B44C 122
Patent
active
059850906
ABSTRACT:
A polishing cloth mounted on a turntable of a polishing apparatus and a polishing apparatus having such a polishing cloth for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing cloth comprises a first elastic region contacting the surface of the workpiece and having a certain elastic modulus, and a second elastic region contacting the surface of the workpiece and having an elastic modulus different from the first elastic region. The second elastic region is surrounded by the first elastic region and has a smaller dimension in a radial direction of the turntable than a diameter of the workpiece when the second elastic region is held in contact with the workpiece. The position of the second elastic region is determined on the basis of an area in which the second elastic region acts on the workpiece.
REFERENCES:
patent: 5578362 (1996-11-01), Reinhardt et al.
patent: 5609517 (1997-03-01), Lofaro
patent: 5769699 (1998-06-01), Yu
patent: 5888126 (1999-03-01), Hirose et al.
Aoyama Fujio
Kato Koji
Kikuta Ritsuo
Takahashi Tamami
Ebara Corporation
Goudreau George
Powell William
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