Polishing cloth and method of manufacturing semiconductor...

Abrasive tool making process – material – or composition – With synthetic resin

Reexamination Certificate

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C451S526000

Reexamination Certificate

active

10994229

ABSTRACT:
A polishing cloth used in the chemical mechanical polishing treatment comprises a molded body of (meth)acrylic copolymer having an acid value of 10 to 100 mg KOH/g and a hydroxyl group value of 50 to 150 mg KOH/g.

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patent: 2001-291685 (2001-10-01), None
patent: 2002-190460 (2002-07-01), None
patent: WO 02/28598 (2002-04-01), None

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