Polishing cloth and method of manufacturing semiconductor...

Details Polishing cloth and method of manufacturing semiconductor... Polishing cloth and method of manufacturing semiconductor...

2011-02-08

2011-02-08

Norton, Nadine G (Department: 1713)

Semiconductor device manufacturing: process

Chemical etching

C438S692000, C216S088000, C051S298000, C051S299000, C051S307000, C451S526000

Reexamination Certificate

active

07884020

ABSTRACT:
A polishing cloth used in the chemical mechanical polishing treatment comprises a molded body of (meth)acrylic copolymer having an acid value of 10 to 100 mg KOH/g and a hydroxyl group value of 50 to 150 mg KOH/g.

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