Abrading – Precision device or process - or with condition responsive... – Computer controlled
Reexamination Certificate
2005-05-03
2005-05-03
Wilson, Lee D. (Department: 3723)
Abrading
Precision device or process - or with condition responsive...
Computer controlled
C451S038000, C451S048000, C451S075000, C076S108600
Reexamination Certificate
active
06887125
ABSTRACT:
A polishing apparatus includes a table on which a polishing target member is placed, and at least one nozzle which sprays a polishing solution to a surface of the polishing target member so as to form, by polishing, the surface of the polishing target member. The nozzle and the polishing target member move relative to each other, and an angle of the nozzle is changeable.
REFERENCES:
patent: 5636558 (1997-06-01), Sanders et al.
patent: 5709587 (1998-01-01), Shaffer
patent: 5759086 (1998-06-01), Klingel
patent: 5791968 (1998-08-01), Matsumura et al.
patent: 5910338 (1999-06-01), Donde
patent: 5951369 (1999-09-01), Kordonski et al.
patent: 5971835 (1999-10-01), Kordonski et al.
patent: 6168502 (2001-01-01), Allman et al.
patent: 6244934 (2001-06-01), Miyai et al.
patent: 6305261 (2001-10-01), Romanini
patent: 6733369 (2004-05-01), Stacklies et al.
patent: 26 07 097 (1977-08-01), None
patent: 3-136769 (1991-06-01), None
patent: 05-057591 (1993-03-01), None
patent: 05-771151 (1993-03-01), None
patent: 05-201737 (1993-08-01), None
patent: 5-253841 (1993-10-01), None
patent: 05-277975 (1993-10-01), None
patent: 2000-127044 (2000-05-01), None
patent: 2000-320792 (2000-11-01), None
patent: 2001-92514 (2001-04-01), None
Frishauf Holtz Goodman & Chick P.C.
Ojini Anthony
Olympus Optical Co,. Ltd.
Wilson Lee D.
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