Polishing apparatus and polishing method

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

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Details

C700S164000

Reexamination Certificate

active

08078306

ABSTRACT:
An apparatus polishes an object material such as a film on a substrate. This apparatus includes a polishing table for holding a polishing pad having a polishing surface, a motor configured to drive the polishing table, a holding mechanism configured to hold a substrate having an object material to be polished and to press the substrate against the polishing surface, a dresser configured to dress the polishing surface, and a monitoring unit configured to monitor a removal amount of the object material. The monitoring unit is operable to calculate the removal amount of the object material using a model equation containing a variable representing an integrated value of a torque current of the motor when polishing the object material and a variable representing a cumulative operating time of the dresser.

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patent: 6416617 (2002-07-01), Yoshida et al.
patent: 6517412 (2003-02-01), Lee et al.
patent: 7108580 (2006-09-01), Ushio et al.
patent: 7475368 (2009-01-01), Angyal et al.
patent: 2004-106123 (2004-04-01), None
patent: 2004-158506 (2004-06-01), None
patent: 2005-342841 (2005-12-01), None
patent: 2004-035265 (2004-04-01), None

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