Polishing apparatus and polishing method

Abrading – Abrading process – Glass or stone abrading

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Details

451207, 451288, 451388, 451390, B24B 100

Patent

active

061494992

ABSTRACT:
A polishing apparatus comprises holding means for holding an object with the surface to be polished being exposed, first driving means for pressing the holding means against the polishing cloth with variable pressing force and rotating the holding means. It also comprises a guide ring body, provided around the holding means and independent of rotation of the holding means, a lower end of the guide ring body being brought into contact with the polishing cloth. It further comprises second driving means for pressing the guide ring body against the polishing cloth with variable pressing force and rotating the guide ring body independent of rotation of the holding means.

REFERENCES:
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patent: 5584751 (1996-12-01), Kobayashi et al.
patent: 5762539 (1998-06-01), Nakashiba et al.
patent: 6019670 (2000-02-01), Cheng et al.
patent: 6019868 (2000-02-01), Kimura et al.
patent: 6024630 (2000-02-01), Shendon et al.
Naoto Miyashita, et al., "The Current State of Processing and Problems of Chemical-Mechanical Polishing on the Semiconductor Device Manufacturing," Journal of the Japan Society for Precision Engineering, vol. 62, No. 4, (1996), pp. 491-495.

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