Polishing apparatus and method using a rotary work holder travel

Details Polishing apparatus and method using a rotary work holder travel Polishing apparatus and method using a rotary work holder travel

1993-02-09

1996-01-30

Kisliuk, Bruce M.

Abrading

Machine

Stationary tool

451 41, 451320, 451314, 451317, 451394, 451398, 451143, 451246, B24B 700

Patent

active

054876974

ABSTRACT:
The present invention relates to an apparatus for polishing semiconductor wafers and, in particular, one in which the polishing pads are linear, that is, the polishing pads have a long linear dimension relative to their width and have a uniform cross-section along this linear dimension. In addition, the wafer holder travels in a straight line parallel to the long linear dimension of the polishing pads.

REFERENCES:
patent: 4141180 (1979-02-01), Gill, Jr. et al.
patent: 4193226 (1980-03-01), Gill, Jr. et al.
patent: 4663890 (1987-05-01), Brandt
patent: 4680893 (1987-04-01), Cronkhite et al.
patent: 4918870 (1990-04-01), Torbert et al.
patent: 4934102 (1990-06-01), Leach et al.
patent: 5113622 (1982-05-01), Nishiguchi et al.
patent: 5123214 (1992-06-01), Ishimura et al.
patent: 5230184 (1993-07-01), Bukhman

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