Polishing apparatus and method

Details Polishing apparatus and method Polishing apparatus and method

2005-08-30

2005-08-30

Morgan, Eileen P. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S041000, C451S036000

Reexamination Certificate

active

06935932

ABSTRACT:
A polishing apparatus and method has a function of polishing a surface of a film formed on a substrate to a flat mirror finish and a function of polishing unnecessary metal film such as copper film deposited on an outer peripheral portion of the substrate to remove such unnecessary metal film. The polishing apparatus comprises a surface polishing mechanism comprising a polishing table having a polishing surface and a top ring for holding the substrate and pressing the substrate against the polishing surface of the polishing table to thereby polish a surface of the substrate, and an outer periphery polishing mechanism for polishing an outer peripheral portion of the substrate.

REFERENCES:
patent: 5149337 (1992-09-01), Watanabe
patent: 5274959 (1994-01-01), Dyer et al.
patent: 5454748 (1995-10-01), Gottschald
patent: 5882539 (1999-03-01), Hasegawa et al.
patent: 5885135 (1999-03-01), Desorcie et al.
patent: 6066565 (2000-05-01), Kuroki et al.
patent: 6093087 (2000-07-01), Hakomori et al.
patent: 6102777 (2000-08-01), Duescher et al.
patent: 6162730 (2000-12-01), Kai et al.
patent: 6234879 (2001-05-01), Hasegawa et al.
patent: 6267649 (2001-07-01), Lai et al.
patent: 6352927 (2002-03-01), Kishimoto
patent: 52-32668 (1977-03-01), None
patent: 52-44162 (1977-04-01), None
patent: 57-96766 (1982-06-01), None
patent: 59-58827 (1984-04-01), None
patent: 5-6881 (1993-01-01), None
patent: 6-315829 (1994-11-01), None
patent: 7-193030 (1995-07-01), None
patent: 11-33887 (1999-02-01), None
patent: 11-90801 (1999-04-01), None
patent: 11-104942 (1999-04-01), None

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