Abrading – Abrading process – Utilizing fluent abradant
Reexamination Certificate
2005-02-22
2005-02-22
Shakeri, Hadi (Department: 3723)
Abrading
Abrading process
Utilizing fluent abradant
C451S060000, C451S160000, C451S285000, C451S314000, C438S692000, C156S345120
Reexamination Certificate
active
06857940
ABSTRACT:
A polishing method with a polishing apparatus includes an electrode constituted as a plurality of electrode elements, a device of driving the electrode, and dielectric abrasive particles disposed between the electrode and a workpiece. Polishing pressure is applied to the particles by a Coulomb force generated when an alternating-current voltage is applied to the electrode.
REFERENCES:
patent: 5575706 (1996-11-01), Tsai et al.
patent: 5624300 (1997-04-01), Kishii et al.
patent: 5685766 (1997-11-01), Mattingly et al.
patent: 6010964 (2000-01-01), Glass
patent: 6066030 (2000-05-01), Uzoh
patent: 6113464 (2000-09-01), Ohmori et al.
patent: 6190494 (2001-02-01), Dow
patent: 6217423 (2001-04-01), Ohmori et al.
patent: 6368190 (2002-04-01), Easter et al.
patent: 6537139 (2003-03-01), Ohmori
patent: 6576552 (2003-06-01), Kojima et al.
patent: 6620336 (2003-09-01), Nakamura
Akagami Yoichi
Satou Yukichi
Yamamoto Chikayoshi
Governor of Akita prefecture
Shakeri Hadi
LandOfFree
Polishing apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polishing apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polishing apparatus and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3510318