Polishing apparatus

Abrading – Machine – Rotary tool

Patent

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Details

451 60, 451446, B24B 700

Patent

active

056790635

ABSTRACT:
A polishing apparatus for polishing a surface of an object such as a semiconductor wafer includes a turntable having a polishing cloth mounted on an upper surface thereof, a top ring for holding and pressing the object against the polishing cloth, and a plurality of radially arranged nozzles for supplying a polishing solution, containing abrasive material, of different concentrations that differ along a radial direction of the polishing cloth.

REFERENCES:
patent: 3979239 (1976-09-01), Walsh
patent: 4059929 (1977-11-01), Bishop
patent: 5478435 (1995-12-01), Murphy et al.
patent: 5584749 (1996-12-01), Mitsuhashi et al.

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