Polishing apparatus

Abrading – Precision device or process - or with condition responsive... – By optical sensor

Reexamination Certificate

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Details

C451S005000, C451S041000

Reexamination Certificate

active

06913513

ABSTRACT:
A polishing apparatus comprises a polishing table having a polishing surface, a top ring for holding a substrate and pressing a surface of the substrate against the polishing surface to polish the surface of the substrate, and at least one optical measuring device disposed adjacent to the outer peripheral portion of the polishing table and below the polishing surface of the polishing table for measuring the thickness of a layer formed on the surface of the substrate. The polishing apparatus further comprises at least one notch formed in the peripheral portion of the polishing table. The notch allows light emitted from the optical measuring device to pass therethrough and be incident on the surface of the substrate and allows light reflected from the surface of the substrate to pass therethrough and be incident on the optical measuring device.

REFERENCES:
patent: 2231900 (1941-02-01), Geoffrion
patent: 2979867 (1961-04-01), Beaver
patent: 5672091 (1997-09-01), Takahashi et al.
patent: 5674109 (1997-10-01), Kanzawa et al.
patent: 5964643 (1999-10-01), Birang et al.
patent: 6213844 (2001-04-01), Lenkersdorfer
patent: 6217410 (2001-04-01), Holzapfel et al.
patent: 6334807 (2002-01-01), Lebel et al.
patent: 245213 (1963-04-01), None
patent: 2207626 (1989-02-01), None
patent: 403234467 (1991-10-01), None
patent: 06-252113 (1994-09-01), None

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