Polishing apparatus

Details Polishing apparatus Polishing apparatus

1996-08-20

1998-11-03

Rose, Robert A.

Abrading

Machine

Rotary tool

451 67, 451 73, 451 5, B24B 722, B24B 5100

Patent

active

058300457

ABSTRACT:
A polishing apparatus polishes a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a storage cassette for storing workpieces to be polished, at least two polishing units each having at least a turntable with a polishing cloth mounted thereon and a top ring for supporting a workpiece and pressing the workpiece against the polishing cloth, and a cleaning unit for cleaning a workpiece which has been polished by either one of the polishing units in such a state that the workpiece is removed from the top ring. The polishing apparatus further includes a transfer robot for transferring a workpiece between two of the storage cassette, the polishing units and the cleaning unit.

REFERENCES:
patent: 4141180 (1979-02-01), Gill, Jr. et al.
patent: 4680893 (1987-07-01), Cronkhite et al.
patent: 5329732 (1994-07-01), Karlsrud et al.
patent: 5468302 (1995-11-01), Thietje
patent: 5616063 (1997-04-01), Okumura et al.
patent: 5618227 (1997-04-01), Tsutsumi et al.
patent: 5649854 (1997-07-01), Gill, Jr.
patent: 5655954 (1997-08-01), Oishi et al.

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