Polishing agent, method for producing the same and method for po

Details Polishing agent, method for producing the same and method for po Polishing agent, method for producing the same and method for po

1996-09-25

1998-06-16

Jones, Deborah

Abrasive tool making process, material, or composition

With inorganic material

Clay, silica, or silicate

51309, 106 3, C09G 102

Patent

active

057662797

ABSTRACT:
A fine particulate polishing agent is based on cerium oxide and silicon oxide; a slurry polishing agent comprises the foregoing fine particulate polishing agent which can be prepared by a method which comprises the steps of mixing, with stirring, cerium oxide fine particles, silica sol and a liquid; drying the mixture; mixing the material with a liquid; and then subjecting the mixture to deagglomeration using a wet pulverizing mill to give a slurry. Preferably, the dried particulate material is subjected to a thermal treatment at a high temperature of 150.degree. to 1200.degree. C., preferably 800.degree. to 900.degree. C., thereby to produce a solid solution of cerium oxide and silicon oxide. The slurry polishing agent can ensure the achievement of surface roughness comparable to or superior to that achieved by the colloidal silica polishing agents and a high polishing rate at least comparable to that achieved by the conventional cerium oxide polishing agents.

REFERENCES:
patent: 4769073 (1988-09-01), Tastu et al.
patent: 5137541 (1992-08-01), Foster
patent: 5264010 (1993-11-01), Brancaleoni et al.
patent: 5389352 (1995-02-01), Wang
patent: 5525191 (1996-06-01), Manier et al.

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