Polishing agent

Details Polishing agent Polishing agent

2007-02-23

2010-11-16

Culbert, Roberts (Department: 1716)

Compositions

Etching or brightening compositions

C216S089000, C438S693000

Reexamination Certificate

active

07833435

ABSTRACT:
The invention relates to the use of gluconates in the production of semiconductor wafers, preferably in the polishing of the semiconductor wafers during the production process, and to a polishing agent based on an abrasive substance and/or colloid and a mixture of disuccinates or methylglycine diacetic acid (MGDA) and gluconates.

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