Polish process and slurry for planarization

Details Polish process and slurry for planarization Polish process and slurry for planarization

1997-01-24

1999-03-02

Bonner, Melissa

Compositions: coating or plastic

Coating or plastic compositions

Polishes

439693, 51509, B24B 100, C09G 102

Patent

active

058764909

ABSTRACT:
A slurry containing abrasive particles and exhibiting normal stress effects. The slurry further contains non-polishing particles resulting in reduced polishing rate at recesses, while the abrasive particles maintain high polish rates at elevations. This leads to improved planarization.

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patent: 5480476 (1996-01-01), Cook et al.
patent: 5603739 (1997-02-01), Neuland
patent: 5636296 (1997-06-01), Garino
W.L. Silvernail et al, The Mechanism of Glass Polishing, The Glass Industry, vol. 52, pp.172-175, May 1971.

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