Poled plasma deposition

Details Poled plasma deposition Poled plasma deposition

2004-04-24

2009-11-03

Zervigon, Rudy (Department: 1792)

Coating apparatus

Gas or vapor deposition

With treating means

C156S345430, C156S345450

Reexamination Certificate

active

07610874

ABSTRACT:
A poled polymer structure is formed on the surface of a substrate by poling a nonlinear optical reactant during a plasma polymerizing deposition of the reactant onto the surface. The substrate is fixed between the positive plasma-generating and ground electrodes in an air-evacuated chamber so that the substrate electrically floats relative to the electrodes. This arrangement permits the application of an electrostatic poling field to the depositing polymer structure while the plasma excitation power is maintained. The electrostatic poling field is produced by the application of a dc voltage to poling electrodes that can be arranged in various configurations relative to the substrate.

REFERENCES:
patent: 5217501 (1993-06-01), Fuse et al.
patent: 5306572 (1994-04-01), Ohashi et al.
patent: 5932302 (1999-08-01), Yamazaki et al.
Basic Electrical Engineering 5th Ed., A.E.Fitzgerald et al, McGraw-Hill Book Co., pp. 855.

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