Pole trimming technique for high data rate thin film heads

Details Pole trimming technique for high data rate thin film heads Pole trimming technique for high data rate thin film heads

1996-07-17

1999-02-23

Codd, Bernard P.

Etching a substrate: processes

Forming or treating article containing magnetically...

216 11, 216 51, 216 66, 216 72, 216 76, 216 79, 430320, 438 3, 438104, B44C 122

Patent

active

058740104

ABSTRACT:
A method for trimming a pole used in a read-write head comprises the step of depositing a metallic layer on a layer of pole material, patterning the metallic layer so that it can serve as a mask, and ion beam etching the pole material with nitrogen ions. Of importance, a thin nitride layer forms on the metallic layer so that the etch rate of the metallic layer during ion beam etching is slowed. Alternatively, in lieu of the metallic layer, a nitride layer can be used.

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