X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2005-08-30
2005-08-30
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S070000, C378S071000, C378S073000, C378S086000
Reexamination Certificate
active
06937694
ABSTRACT:
A method for measuring a pole of a sample, using a reflection method, is effective substantially over all measurement regions ranging from the region of high-tilting-angle α of a conventional pole measuring to the in-plane diffraction region corresponding to low-tilting-angle α.
REFERENCES:
patent: 2001-56304 (2001-02-01), None
Nov. 11, 1998 Grazing Incidence In-Plane Diffractometer for Thin-Films Kazuhiko Omote et al. X-sen Bunseki no Shinpo vol. 30 pp. 205-218.
1999 Dai 50 kai Sosei Kako Rengo Kouenkai Kouen Ronbunshuu, (Japan) pp. 35-36.
Endo Kamihisa
Matsuo Ryuji
Omote Kazuhiko
Yokoyama Ryouichi
Glick Edward J.
Jordan and Hamburg LLP
Rigaku Corporation
Thomas Courtney
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